對(duì)空氣凈化工程中溫度, 濕度及煙霧的控制
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- 發(fā)布日期：2017-04-13 17:50:50
在空氣凈化工程中，除了控制顆粒，空氣中溫度，濕度和煙霧的含量也需要規(guī)定與控制。
In the air purification project, in addition to control particles, air temperature, humidity and smoke content also need to be specified and controlled.
溫度控制對(duì)操作員的舒適性與工藝控制是很重要的。許多利用化學(xué)溶劑來(lái)做刻蝕與清洗的工藝都在沒(méi)有溫度控制的設(shè)備箱內(nèi)完成，只依賴(lài)于空氣凈化工程 http://www.jnjkjh.com/ 溫度的控制。這種控制非常重要，因?yàn)榛瘜W(xué)反應(yīng)會(huì)隨溫度的變化而不同，例如，每升高十?dāng)z氏度，刻蝕速率參數(shù)加二。通常的室溫為72華氏度，上下幅度兩度。
Temperature control is very important for operator comfort and process control. Many chemical solvents are used to do the etching and cleaning of the equipment in the absence of temperature control, and only rely on the control of the temperature of the air purification project. This control is very important, because the chemical reaction with the temperature changes, for example, every ten degrees Celsius, the etching rate parameters plus two. The usual room temperature is 72 degrees F, and the upper and lower ranges are twice.
相對(duì)濕度也是一個(gè)非常重要的工藝參數(shù)，尤其在光刻工藝中。在這個(gè)工藝中，要在晶片表面鍍上一層聚合物作為刻蝕膜版。如果濕度過(guò)大，晶圓表面太潮濕，會(huì)影響聚合物的結(jié)合，就象在潮濕的畫(huà)板上繪畫(huà)一樣。如果濕度過(guò)低，晶圓表面就會(huì)產(chǎn)生靜電，這些靜電會(huì)從空氣中吸附微粒。一般相對(duì)濕度應(yīng)保持在15%到50%之間。
Relative humidity is also a very important process parameter, especially in the process of lithography. In this process, a layer of polymer is coated on the surface of the wafer as an etch film. If the humidity is too large, the surface of the wafer is too wet, will affect the polymer combination, like painting in the wet canvas like. If the humidity is too low, the surface of the wafer will produce static electricity, which will be absorbed from the air. General relative humidity should be maintained between 15% to 50%.
煙霧是空氣凈化工程的另一個(gè)空中污染源。而它同樣對(duì)光刻工藝影響最大。光刻中的一個(gè)步驟與照相中的曝光相似，是一種化學(xué)反應(yīng)工藝。臭氧是煙霧中的主要成分，易影響曝光，必須被控制。在進(jìn)入空氣的管道中裝上碳素過(guò)濾器可吸附臭氧。
Smoke is another air pollution source in the air purification project. And it is also the biggest influence on the lithography process. One step in the process is similar to that of a photograph, a chemical reaction process. Ozone is a major component of smog, which is easily affected by exposure and must be controlled. In the pipeline into the air filled with the carbon filter adsorption ozone.
